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Vaporizer system for 2 or more precursors

Vaporizer system for HMDSO and another precursor
Gallery Vaporizer system for 2 or more precursors (click to open)
Vaporizer system for DEZ and water – overall view. System for the simultaneous supply of 3 processes. Control of SiCl4- and SiHCl3-vapours. 8 control loops for each precursor. Flow control of the vaporized precursors PCl3, GeCl4 and SiCl4. Vaporizer system for precursors PCl3, GeCl4 and SiCl4. Vaporizer system for HMDSO and another precursor Control of a vaporizer system – detail of the internal view. Vaporizer system for DEZ- and water vapour– overall view. System for the simultaneous supply of 2 processes. Flow control of 4 vaporized precursors and 4 gases. Control of the MFCs per serial interface Profibus DP Flow control system for DEZ-vapour and other process gases. Flow control of DEZ and TMAl with pressure based MFCs with 3 control loops for each precursor. Control system for a vaporizer system with 2 precursors combined with the control of the corresponding supply system. Communication to the up-stream controller via serial interface Profibus DP. Process screen of the vaporizer system with 2 precursors and 3 control loops for each precursor System for vaporization and flow control of DEZ and TMAl Gas- and vapour control for a FHD Flame Hydrolysis Deposition System with BCl3, BBr3, SiCl4 , GeCl4, POCl3 and PCl3.

For processes requiring more than one liquid precursor SIGA offers vaporizer systems designed to handle one or more evaporators.

The vaporizers integrated in one system are controlled by on shared programmable control system. Also with this solution, each evaporator can supply control vapour flow to one or more points of use. Compared to other designs SIGA vaporizer systems offer the chance to reduce the number of components and control elements and to reduce the necessary mounting space. Altogether resulting in an economic solution and offering you cost saving.